The magnetic field distribution of the unbalance magnetron sputtering could be changed to extend the plasma area and to impose the ions to bombard the films,for that get excellent quality films.In this paper,a four targets closed-filed unbalance magnetron sputtering was introduced,changing the position of other targets,to investigate the influence of the magnetic filed distribution on the prepared films properties.The structure of the films was studied by X-Ray Diffraction (XRD).And the strain-stress measurement for the films was determined by two means,surface profilometer and XRD grazing incidence.The ion current is a significant characterization for the changing distribution of magnetic field.Changing distribution state of magnetic field,the density of plasma area around the substrate was increased and the bombardment ion current was improved.The results revealed that the ion current enhanced more than 50% by changing magnetic field distribution than by elevating the bias voltage on the substrate.