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Quantitative Measurement of Residual Stress in Silicon-based Semiconductor by Raman Spectroscopy
【机 构】
:
DepartmentofMechanics,TianjinUniversity,Tianjin,ChinaSchoolofMechanicalEngineering,TianjinUniversity
【出 处】
:
The 17th Asian Conference on Experimental Mechanics)(第十七届亚洲实
【发表日期】
:
2018年10期
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