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Thin films of tungsten disulfide (WS2) were deposited on 3Cr13 martensitic stain less steel substrate by RF sputtering.The as-deposited films were annealed at 200,400 and 600℃ for 2h in vacuum.The vacuum degree was 5×10-4Pa.Composition,surface morphology,structure properties and tribological behavior were studied by EDS,SEM,X-ray diffraction techniques and tribometer,respectively.At 200℃,the films showed low crystallization structure and the tribological behavior was not improved obviously.But at 400℃,the films tribological behavior were improved obviously and non-crystalline to hexagonal structural transition appeared.When annealing temperature rose to 600℃,the films were desquamated from substrate.The results suggested that suitable vacuum annealing was able to promote crystallization and improve tribological performance of RF sputtering WS2 films.