纳米尺度上DHM技术对石膏晶体溶解行为的原位监测

来源 :中国硅酸盐学会水泥分会第六届学术年会 | 被引量 : 0次 | 上传用户:sure565372
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  近年来,对石膏晶体在溶解过程中表面形貌的研究大多侧重于溶蚀孔洞的形成和生长,而对于石膏晶体表面的绝对溶解速率却鲜有报道.本论文采用了反射型全息显微镜为测试手段,测试了在流水情况下,石膏晶体(O1O)解理面上,溶蚀孔洞,解理面阶梯,以及无缺陷晶面的绝对溶解速率.对七个不同的解理面进行了局部随机采样观察,通过测量局部晶面形貌特征的变化,确定了局部晶面的溶解速率,并且发现了四种特征行为:1)无溶蚀孔洞以及其他明显缺陷的平滑晶面,其溶解速率相对较慢;2)深度浅,但尺寸较宽的溶蚀孔洞,其溶解速率相对平滑晶面略快;3)深且窄的溶蚀孔洞,其溶解速率超过了浅却宽的溶蚀孔洞;4)数量上较为少见,高度大约在亚微米级的解理面阶梯,像波纹一样在解理面上移动.其造成的局部溶解速率大约是深且窄的溶蚀孔洞的五倍左右.前三种表面特征行为可用一个连续的,类似双峰分布模型概括,其平均的摩尔溶解速率为3.0 umol m-2 s-1,方差为0.7 umol m-2 s-1.
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