A New Method for Depth Profiling of Nanometer Thin Layer

来源 :6th Asia-Pacific Winter Conference on Plasma Spectrochemistr | 被引量 : 0次 | 上传用户:ZXX198811
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  For depth profile analysis of nanometer layers,classical methods such as secondary ion mass spectrometry(SIMS)and X-ray photoelectron spectroscopy(XPS)are restrict because of strict requirements for pressure condition.Atmospheric-pressure(AP)discharge was an attractive choice due to its convenient operation and low equipment cost.
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