The deposition of elemental and compound conductive materials and dielectrics by dual magnetron sputtering is a standard technique for industrial thin-film layers.Applications include OLED,passivation layers,solar cell active layers,and optical and low-e coatings on glass and web.A new generation of power supplies with configurable powers from 30 kW to greater than 200 kW has been developed for large-area dual magnetron sputtering applications.These power supplies have settable frequency,duty cycle,and rise time,and optimizing these parameters can influence film properties such as index of refraction,crystallinity or morphology.Selectable fixed frequency enables operation of the process at the lowest possible frequency with the highest deposition rate.New features,like the ability to control power to each magnetron by changing duty cycle,enable comparatively more power to be delivered to one of the targets in order to compensate for differences in remaining target material.Arc energy is dramatically reduced,which enables lower defect rate in deposited films.This paper describes application of this new technology for increasing flexibility of coating lines and extending process performance.