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5. Atomic layer deposition on swelling-induced mesoporous block copolymers for highly porous and robust

Atomic layer deposition on swelling-induced mesoporous block copolymers for highly porous and robust

来源 :第一届国际ALD应用大会暨第二届中国ALD学术交流会 | 被引量 : 0次 | 上传用户：qingfeng112233

【作 者】

：

Yong Wang 

【机 构】

：

State Key Laboratory of Materials-Oriented Chemical Engineering,College of Chemistry and Chemical En

【出 处】

：

第一届国际ALD应用大会暨第二届中国ALD学术交流会

【发表日期】

：

2012年4期

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