论文部分内容阅读
Velocity distribution of sputtered Al atoms in an ICP reactor
【机 构】
:
FreescaleSemiconductorInc.,38921Crolles,France;LaboratoiredesTechnologiesdelaMicroélectronique,CNRS,
【出 处】
:
9th Asia-Pacific Conference on Plasma Science and Technology
【发表日期】
:
2008年10期
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