With HMDSO as monomer and Ar as a diluated gas,Ag/SiO2 nanocomposite is prepared on silicon wafer (p-Si(lO0)), by using magnetron sputtering plasma technology with assisted by inductively coupled plasma.The nanocomposite structure, hydrophilic or hydrophobic property, and surface topography are detected by FTIR, WCA and AFM.And film structure affected by the plasma technological parameter, such as sputtering power, deposition time, the ratio of monomer to Ar, working pressure and so on were all investigated in ths paper.