Error analysis for the CGH to testing the F2,φ400 mirror

来源 :2014年光子与光学工程国际会议暨西部光子学学术会议 | 被引量 : 0次 | 上传用户:peterpetersxs
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  Computer-generated holograms(CGHs)are commonly used in optical interferometry for producing reference wavefronts with desired shapes.Uncertainties from the computer generated hologram(CGH)manufacturing processes produce errors in the finished hologram and the generated reference wavefront.CGH errors compromise the accuracy of the interferometric measurements.Although errors in the CGHs may be introduced during either the design or the fabrication process,fabrication uncertainties are mostly responsible for the degradation of the quality of CGHs.To specify and verify detection accuracy of aspheric surface testing system,fabrication errors of the CGHs will be analyzed.Methods are discussed for measuring the fabrication errors in the CGH substrate,duty cycle,etching depth.An example of an aspheric mirror of F/2,φ400,analysis of the wavefront errors from fabrication nonuniformities for a phase CGH is given.
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