Rigorous 3D Photolithography Simulation

来源 :第八届工业与应用数学国际大会 | 被引量 : 0次 | 上传用户:cygggg
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  The complexity of modern photolithography makes extensive simulations indispensable.In this talk,based on the parallel adaptive finite element toolbox PHG,an extremely fast time-harmonic finite element solver was developed to simulation of light scattering from DUV/EUV masks.
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