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5. Sidewall roughness measurement for shallow silicon etching based on atomic force microscope

Sidewall roughness measurement for shallow silicon etching based on atomic force microscope

来源 :The 4th Advances in Optoelectronics and Micro/nano-optics (A | 被引量 : 0次 | 上传用户：nibeibei

【摘 要】

：

The fabrication and characterization of fine silicon structures with high-quality etching profile and sidewall morphology have been increasingly demandedby several fields,such as MEMS,microfluidic chi

【作 者】

：

Lei Wan Xuan Li Ning Zhu Rui-ying Zhang Ting Mei 

【机 构】

：

Laboratory of Nanophotonic Functional Materials and Devices,Institute of Optoelectronic Material and

【出 处】

：

The 4th Advances in Optoelectronics and Micro/nano-optics (A

【发表日期】

：

2014年5期

【关键词】

：

AFM measurement sidewall roughness sample preparation shallow silicon etching 

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　　The fabrication and characterization of fine silicon structures with high-quality etching profile and sidewall morphology have been increasingly demandedby several fields,such as MEMS,microfluidic chips,polymer optical waveguides,and Lab-on-chip system,etc.

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