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Electrical and microstructural properties of N+ ion-implanted ZnO and ZnO∶Ag thin films
【机 构】
:
Department of Electrical and Computer Engineering,Texas A &M University,College Station,TX 77843-312
【出 处】
:
第六届国际氧化锌及相关材料研讨会
【发表日期】
:
2010年4期
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