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In high-performance metal products ultra-trace amounts of additives and impurities often have great influence on performance and grade.
Advances in Routine Trace Analysis of High-Purity Metals by HR ICP OES on PlasmaQuant(R) PQ 9000
【摘 要】
：
In high-performance metal products ultra-trace amounts of additives and impurities often have great influence on performance and grade.
【机 构】
：
Konrad-Zuse-Straβe 1,07745 Jena,German
【出 处】
：
6th Asia-Pacific Winter Conference on Plasma Spectrochemistr
【发表日期】
：
2015年期
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