论文部分内容阅读
This paper describes maskless lithography as a rapid and cost-effective technique forfabricating high-quality microfluidic devices in laboratories.The detailed effects of exposureparameters on microstructure features are explored.A quantitative analysis of these effectsprovides insights into the device design and the selection of optimum processing parameters.To overcome the limitation of small exposure area,subregion stitching and sequentialexposure are adopted for fabricating larger patterns.Seamless stitching between adjacentexposure subregions is achieved by optimizing the grayscale values of the stitchingside/corner.These data are also valuable for exploring grayscale and multi-step lithography.Various hydrodynamic microdevices are then fabricated and characterized to validate theoptimized parameters.