Probing the growth mechanism of InAs nanowires grown by using selective area molecular beam epitaxy

来源 :第十二届全国分子束外延学术会议 | 被引量 : 0次 | 上传用户:snsjgl
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Ⅲ-Ⅴ semiconductor nanowire(NW)-offers unique electrical and optical properties therefore viable for the next generation high speed electronics,optoelectronics,biosensing,energy storage devices,etc [1,2].From the variety of functional semiconductor materials that have successfully been synthesis as NWs,InAs NWs are very interesting due to their superior material properties such as high electron mobility,strong quantum confinement effect,low effective electron mass and good quality ohmic contacts [1,2,4].
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