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5. Detection of Ultra-traceNanopaticles for Semiconductor Manufacturing Quality Control

Detection of Ultra-traceNanopaticles for Semiconductor Manufacturing Quality Control

来源 :第二届微流控、纳流控及芯片实验室国际会议 | 被引量 : 0次 | 上传用户：doer

【摘 要】

：

As the integration of electronic devices being greatly increased.Semiconductor manufacturing technology has been developedto nanoscale.However,nano-manufacture brings many problems which needed not be

【作 者】

：

Jian Zhang Jian Wang HaochenQi Jayne Wu ChunchangWang Xin Liu ZhengfengHuang 

【机 构】

：

School of Electronic Science and Applied Physics,Hefei University of Technology,Hefei 230009,China

【出 处】

：

第二届微流控、纳流控及芯片实验室国际会议

【发表日期】

：

2018年10期

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论文部分内容阅读

　　As the integration of electronic devices being greatly increased.Semiconductor manufacturing technology has been developedto nanoscale.However,nano-manufacture brings many problems which needed not be faced when the process base line was at microscale.

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