In this paper,six percent Nb-doped TiO2(NTO)thin filmns were prepared by High Target Utilisation Sputtering(HITUS)on glass substrates at different oxygen pressures at room temperature.After deposition,the samples have been annealed at 500℃ for an hour on the hotplate in air.The structure,optical,electrical,and surface morphology characteristics of the NTO coatings have been analyzed as a function of the film thickness by X-ray diffraction(XRD),UV-Vis spectrophotometer,Hall effect measurements,and field emission scanning electron microscope(FESEM).In the sputtering deposition process the optical and electrical properties of films samples was significantly affected by the different flow rate of oxygen.As the oxygen flow increased,the visible light transmittance of films was significantly improved,but the conductive properties of the film were significantly reduced.The best characteristics have been obtained after optimization of the parameters.The NTO films exhibited that the resistivity(9.4×10-4Ωcm)was minimum while the Hall mobility(3.43cm2V-1-1)and carrier density(3.63× 1021cm-3)were maximum after heating the film at 500℃ when the oxygen flow rate was 6.4sccm,the optical transmittance in the visible light range of the film was about 80-90%.