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Deuterium retention in SiC coated graphite by D2+ implantation
【机 构】
：
InstituteofPlasmaPhysics,ChineseAcademyofSciences,Hefei,Anhui230031,ChinaRadioscienceResearchLaborat
【出 处】
：
第三届中日氚和增值包层技术研讨会
【发表日期】
：
2010年6期
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