【摘 要】
：
A novel alkaline cleaning technology was developed to remove the SiO2 coatings of SiC/SiO2 nanocables,namely treatment of the products in NaOH solution.The
【机 构】
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KeyLaboratoryofPolymerMaterialAdvancedManufactoringsTechnologyofShandongProvincial,QingdaoUniversity
【出 处】
：
第十二届全国X射线衍射学术大会暨国际衍射数据中心(ICDD)研讨会
论文部分内容阅读
A novel alkaline cleaning technology was developed to remove the SiO2 coatings of SiC/SiO2 nanocables,namely treatment of the products in NaOH solution.The products were characterized by X-ray diffraction(XRD),transmission electron microscopy(TEM)and high-resolution transmission electron microscopy(HRTEM).At the reaction temperature of 70℃,the factors including alkaline cleaning time and NaOH concentration affecting the thickness variation of SiO2 coatings were discussed in detail.The results indicated that with the increment of alkaline cleaning time or NaOH concentration,the thickness of SiO2 coatings was reduced gradually until they were completely removed.On the basis of the above characterization and analysis results,the optimum treatment process parameters(reaction temperature 70℃,NaOH concentration lmol L-1 and purification time 40min)of SiC/SiO2 nanocables were selected.Under the condition,the highly purified SiC nanowires were obtained.
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