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为拓展锰铜传感器的高压测试上限 ,本文采用薄膜技术研制了一种新型的锰铜传感器。该传感器采用氧化铝封装 ,后置式结构 ,两步薄膜工艺制作。利用二级轻气炮进行了 40～ 10 7GPa的冲击高压加载 ,试验波形呈现出一理想的平台 ,寿命为 1μs。标定曲线 Px(GPa) =6 .0 371+2 9.819(ΔR/ R0 ) +2 1.5 91(ΔR/ R0 ) 2 - 6 .82 6 7(ΔR/ R0 ) 3近似于一条直线 ,精度达± 3%
In order to expand the upper limit of high voltage test of manganese-copper sensor, a new type of manganese-copper sensor was developed by using thin-film technology. The sensor uses alumina packaging, post-type structure, two-step film production process. High pressure loading of 40 ~ 107GPa was carried out by using two light gas guns. The experimental waveform showed an ideal platform with a life of 1μs. Calibration curve Px (GPa) = 6 .0 371 + 2 9.819 (ΔR / R0) +2 1.5 91 (ΔR / R0) 2 - 6 .82 6 7 (ΔR / R0) 3 Approximate to a straight line with an accuracy of ± 3 %