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5. Spectroscopic Diagnosis of Laser Plasma Source for 6.7 nm Optical Lithography

Spectroscopic Diagnosis of Laser Plasma Source for 6.7 nm Optical Lithography

来源 :2015年国际激光物理研讨会(LPHYS`15) | 被引量 : 0次 | 上传用户：allviolet

【摘 要】

：

For next-generation beyond extreme ultraviolet lithography(EUVL) sources,laser plasma light source with sub-10 nm emission wavelength is required for 11-nm node or even smaller feature size on a micro

【作 者】

：

J Lin 

【机 构】

：

Department of Physics,Changchun University of Science and Technology,7089 weixing Rd,Changchun,China

【出 处】

：

2015年国际激光物理研讨会(LPHYS`15)

【发表日期】

：

2015年5期

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论文部分内容阅读

For next-generation beyond extreme ultraviolet lithography(EUVL) sources,laser plasma light source with sub-10 nm emission wavelength is required for 11-nm node or even smaller feature size on a microchip.

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