Deposition of amorphous diamond films on different substrates by electrolysis of methanol solution

来源 :Fifth International Conference on Surface Engineering(第五届表面工 | 被引量 : 0次 | 上传用户:wangql133
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  Amorphous diamond films were deposited on both (100) silicon and 316L stainless steel substrates at atmospheric pressure and low temperature (60 ℃) with a direct current pulsed power supply using methanol solution as electrolyte.The morphology and microstructure of the films were analyzed by scanning electron microscopy (SEM) and Raman spectroscopy.The friction and wear behavior of the films were examined on the CERT test system.The electrolyte was methanol/deionized water solution in the ratio of 1:5 for silicon substrates,and similar electrolyte for 316L stainless steel substrates.The applied potential was about 1500 V:The distance between the anode and the substrate,the deposition time and the deposition temperature were fixed at 9 mm,2 h and 60 ℃,respectively.
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