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High-rate Sputter Etching by using Hollow Cathode Arc Discharge for Metal Strip Coating
【机 构】
:
Fraunhofer Institute for Electron Beam and Plasma Technology (FEP) Winterbergstrasse 28,Dresden 0127
【出 处】
:
The 8th Asian-European International Conference on Plasma Su
【发表日期】
:
2011年1期
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