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  5. Direct Analysis of Trace REEs in High Purity Nd2O3 using ICP-QQQ

Direct Analysis of Trace REEs in High Purity Nd2O3 using ICP-QQQ

来源 :6th Asia-Pacific Winter Conference on Plasma Spectrochemistr | 被引量 : 0次 | 上传用户：bp0604
【摘 要】
：
ICP-MS is the most commonly used atomic spectrometry technique for the measurement of trace REEs.The measurement of mid-and high-mass REEs in a low-mass REE matrix is,however,very challenging for ICP-
【作 者】
：
Juan-e Song Xiangcheng Zeng Dong Yan Weiming Wu 
【机 构】
：
Agilent Technologies Co.Ltd(China),No.3 .Wangjing Bei Road,Beijing 100102,China
【出 处】
：
6th Asia-Pacific Winter Conference on Plasma Spectrochemistr
【发表日期】
：
2015年5期
【关键词】
：
ICP-QQQ Interference REEs High purity Nd2O3 
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　　ICP-MS is the most commonly used atomic spectrometry technique for the measurement of trace REEs.The measurement of mid-and high-mass REEs in a low-mass REE matrix is,however,very challenging for ICP-MS because REEs have high metal-oxide(M-O)bond strengths,and the oxide ions of the low mass REEs overlap the preferred isotopes of the mid-mass and high-mass REEs.
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