【摘 要】
：
As one of the core in lithography,the UV light source has a great influence on wavelength precision of the system.To meet the requirements of UV light sourc
【机 构】
：
Changchununiversityofscienceandtechnology,China
【出 处】
：
2014年光子与光学工程国际会议暨西部光子学学术会议
论文部分内容阅读
As one of the core in lithography,the UV light source has a great influence on wavelength precision of the system.To meet the requirements of UV light source,it demands UV reflectance coating prepared on Φ220mm quartz lampshade with largecurvature paraboloid.Based on design theory of film,H4 and SiO2 were selected as high and low refractive index materials,with the help of TFCalc,adopting electron beam vacuum coating method,the reflectance coating was prepared,which satisfied the requirements of reflectivity beyond 98.5%within band 365-436nm in the case of 0o-45o incident angles.First the reflctive band width was broadened through the coating stack; then according to the thickness distribution of film,compensation baffle was designed and modified,which ensured the uniformity of reflectance coating in the lampshade.By repeated trials,coating absorption problem was solved by changing the process parameters and coating quality of film was improved with the use of ion source assisted deposition,finally the UV film meets the requirements for use.
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