【摘 要】
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In the past several years,ZnO thin film fabricated by electrochemical deposition has attracted much attention for many researchers because electrochemical t
【机 构】
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State Key Laboratory of Materials Modification by Laser,lon and Electron Beams & School of Physics a
【出 处】
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Fifth International Conference on Surface Engineering(第五届表面工
论文部分内容阅读
In the past several years,ZnO thin film fabricated by electrochemical deposition has attracted much attention for many researchers because electrochemical techniques have their own advantages,such as their low processing temperature,low damage,low-cost,and versatility1.The abstract presents a work for growth of ZnO thin film in 0.1 M Z n(NO3)2 + 0.1 Wt% SDS electrolyt e,where ZnO thin film was formed on single-crystal n-InP(100) (~2.4×1016 cm-3) by electrochemical deposition.ZnO deposited was studied bylinear sweep voltammetry in 0.1 M Zn(NO3)2 + 0.1Wt% SDS electrolyte/InP system in which reduction potential is about-1.2 V versus a reference saturated calomel electrode (SCE) and sweep rate is 5 mVs-1.
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