Development of ellipsometry and its applications in characterization of thin films

来源 :The 9th International Conference on Thin Film Physics and Ap | 被引量 : 0次 | 上传用户:zhanghu216
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  Ellipsometry has been proved as an extremely useful tool to study the optical properties of many kinds of materials with high optical data precision in measurement.Being accurate, fast and non-destructive in data acquisition and characterization of the samples, ellipsometry has been widely applied especially in the scientific research labs and microelectronic industry.
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