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Exploring atomic defects, their migration dynamics and associated kinetic pathway in monolayer MoS2
【机 构】
：
StateKeyLaboratoryofSiliconMaterials,SchoolofMaterialsScienceandEngineering,ZhejiangUniversity,Hangz
【出 处】
：
中国晶体学会第六届学术年会暨会员代表大会
【发表日期】
：
2016年12期
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