TiN and (Ti,Al) N films were prepared by axisymmetric magnetic field (AMF) enhanced arc ion plating (ALP).Based on the results of finite element method (FEM) simulation and the physical mechanism of the cathode spot discharge,the mechanism of the cathode spot motion in different magnetic field conditions was discussed.The results show that the cathode spot motion is affected by AMF by redistributing the dense plasma connected with the initiation of the new spot site.With increasing AMF,there is an increasing tendency for the cathode spot to rotate and drift toward the cathode target edge due to the axisymmetric “retrograde motion” and “acute angle rule”,respectively.In the case of a relatively strong AMF (B//≈30 G),the cathode spot rotates near the edge of the cathode surface and confines to a circular trajectory.The morphology,detailed size distribution,power law distribution and area fraction of Macroparticles (MPs) on the resultant TiN and (Ti,Al) N films were systematically investigated.Fewer and smaller MPs ejection is observed with an increase in the transverse component of AMF.MPs on (Ti,Al) N films is much more and larger than that on TiN films.The MPs distribution indicates a fractal characteristic,and the scattering behavior of MPs on films has more dependence on cathode material than magnetic field applied.The area ratio covered by the MPs decreases by factor of more than 5 and 6 when the transverse magnetic field increases from 0 G to 30 G and 35 G for TiN films and (Ti,Al) N films,respectively.