论文部分内容阅读
Low Damage and Highly Selective Etching of GaAs/AlGaAs Using Cl2/O2 Neutral Beam
【机 构】
:
Department of Advanced Materials Engineering,Sungkyunkwan University,Suwon,Korea
【出 处】
:
The 8th Asian-European International Conference on Plasma Su
【发表日期】
:
2011年期
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