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The Dielectric Constant Change of a-Sic:H Film Deposited by Remote PECVD Using HMDS and PPCS Source
【机 构】
:
Deparment of Advanced Material Engineering,Yonsei University,Seoul 120749,Korea
【出 处】
:
IUPAC 5th International Symposium on Novel Materials and the
【发表日期】
:
2009年12期
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