【摘 要】
：
The influences of vegetation growing on latent heat flux (LHFLX), incident solar radiation (FSDS), reflected solar radiation (FSR) and downward longwave rad
【机 构】
：
InternationalCenterforClimateandEnvironmentSciences,InstituteofAtmosphericPhysics,ChineseAcademyofSc
【出 处】
：
第十七届全国流体力学数值方法研讨会
论文部分内容阅读
The influences of vegetation growing on latent heat flux (LHFLX), incident solar radiation (FSDS), reflected solar radiation (FSR) and downward longwave radiation (FLDS) over 30-90°N were investigated through a couple of modeled simulations.Vegetation growing in this paper was expressed as leaf area index (LAI) increase during the growing season (April to October) between the two LAI datasets.The modeled results showed that at gridcell level, LHFLX and FSR, followed by FSDS,were more sensitive to changes in LAI than FLDS.What is more, with an increase in LAI, LHFLX showed a clearly seasonal increase, while FSR and FSDS decreased.
其他文献
在航空航天飞行器研制过程中存在很多动边界非定常问题，如以导弹发射和级间分离为代表的多体分离问题、以舵面偏转控制为代表的飞行器机动飞行、新概念变形飞行器的自适应
On October 3,2011,three scientists(Bruce A.Beutler,Jules A.Hoffmann and Ralph M.Steinman)won Nobel Prizes in Medicine or Physiology for their discoveries on
Cancer stem cells(CSCs)have been identified in primary breast cancer tissues and cell lines.The CSC population varies widely among cancerous tissues and cel
Annual incident solar radiation at the top of atmosphere (TOA) should be independent of longitudes.However, in many Coupled Model Intercomparison Project ph
陆表气温(LSAT)是全球天气和气候变化研究中最重要的变量，也是评估地球系统模式的重要参量之一.现有的全球长时间的资料都是在逐月或逐日分辨率上，没有以逐小时为分辨率的，
We develop a new and more general formula for the construction of two dimensional nodal Riemann solver for a cell-centered Lagrangian scheme[1-2] developed
拉格朗日(Lagrange,简称"拉氏")方法和ALE (Arbitrary Lagrangian Eulerian)方法中的拉氏过程使用的网格随流体运动,具有物质界面描述准确、方程形式较为简单等优点,是对
A multi-scale method for the hyperbolic systems governing sediment transport in subcritical case is developed.The scale separation of this problem is due to
NS特征边界条件方法(NSCBC)因其能实现对特征波的精确控制和良好的稳定性而备受关注,但其尚不能很好地处理含有体积源项的非定常边界问题,本文针对变加速可压缩瑞利-泰勒
Chemical mechanical polishing (CMP) is a key process widely used in semiconductor manufacturing industry to provide local and global planarity of silicon wa