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5. Atomic layer deposition on powders: Applications in heterogeneous catalysis and surface nanofabricat

Atomic layer deposition on powders: Applications in heterogeneous catalysis and surface nanofabricat

来源 :第三届纳米化学前沿论坛(Frontiers of Nanochemistry-2013) | 被引量 : 0次 | 上传用户：linjianvhai

【摘 要】

：

Born in the microelectronics industry, atomic layer deposition (ALD) boasts unique capability for coating ultra thin films with atomic level precision.Besides the digital control over film thickness,

【作 者】

：

Hao Feng 

【机 构】

：

Xi'an Modern Chemistry Research Institute 168 E.Zhangba Road, Xi'an, Shaanxi, 710065,China

【出 处】

：

第三届纳米化学前沿论坛(Frontiers of Nanochemistry-2013)

【发表日期】

：

2013年2期

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论文部分内容阅读

Born in the microelectronics industry, atomic layer deposition (ALD) boasts unique capability for coating ultra thin films with atomic level precision.Besides the digital control over film thickness, ALD is capable of coating 3-D structures with ultra large surface areas, including various nanopowders and porous materials.

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