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In neural prosthetic systems,a low-impedance electrode-tissue interface is important for maintaining signal quality.However,neural microelectrodes ot~en have high impedance due to their small surface areas.In this paper,we present a simple method of increasing their effective surface areas and then decrease impedance by introducing nanostructures on the electrode sites.The method combines photolithography and electron-beam evaporation with a locally-patterned anodized porous alumina (APA) template.Moreover,the geometrical and electrical properties of Au-nanorod electrodes were demonstrated and compared with conventional planar microelectrodes.