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Multilayered Ti/TiN thick films with 10 μ m thickness were deposited by vacuum arc deposition method using a combination of a Ti target and an Ar/N2 mixture discharge gas.The microstructure and micro-hardness was characterized.The coherence and residual stress was also tested.The experimental results indicated that the hardness and residual of multilayered film depends on both the modulation period and the thickness ratio between Ti and TiN layers.When the ration of Ti/TiN kept at 1∶4, the hardness and residual enhanced with the Ti lamillar thickness increased from 0.25 to 0.5, but reduced afer the thikhness of Ti exceed 0.5 μ m.In additional,When the Ti lamillar thickness kept at 0.5 μ m, the hardness and residual reduced with the ration of Ti/TiN changed from 0.25 to 1.In both series experiment the change of cohesion kept a similar tend to the ratio between redual and hardness.The possible mechanism responsible for the modification of the hardness and periods of films was also discussed.