An atmospheric pressure line-shaped plasma was used to grow transparent SiOx films on glass substrates.The plasma with 13.56MHz RF power used helium(He)and oxygen(O2)mixed as a main plasma working gases and Tetraethoxysilane(TEOS)as precursor.This paper will present the chemical vapor deposition method of SiOx thin films to glass.The nanomechanical properties were measured by the atomic force microscope(AFM)and nanoindentation instrument to analyze the surface roughness,hardness and equivalent modulus.Ellipsometer was used to measure values of(n,k)of SiOx on glass substrate.