论文部分内容阅读
Effect of Applied Pulse Bias on Sheath Characteristics in Plasma Source Ion Implantation with Dielec
【机 构】
:
School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian, Liaoning 1
【出 处】
:
The 11th International Workshop on Plasma-Based Ion Implanta
【发表日期】
:
2011年3期
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