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利用磁控溅射法,在不同工作压强下制备了氧化钨(WO_3)薄膜,研究了工作压强对WO_3膜层微观结构的调控作用,并研究了WO_3膜层微观结构对其电致变色性能的影响。研究结果表明,制备的WO_3薄膜属于非晶相,表面呈峰状结构;随着工作压强的增大,WO_3薄膜膜层微观结构变疏松,电致变色响应时间和循环寿命均减短;在最佳膜层微观结构下,WO_3薄膜光学密度可达0.64,循环寿命达1500周。
The tungsten oxide (WO_3) thin films were prepared by magnetron sputtering at different working pressures. The effect of working pressure on the microstructure of WO_3 films was studied. The effects of the WO_3 film microstructure on the electrochromic properties influences. The results show that the prepared WO_3 thin film belongs to the amorphous phase and the surface has a peaked structure. With the increase of working pressure, the microstructure of the WO_3 thin film becomes loose and the electrochromic response time and cycle life are shortened. Under the optimal film microstructure, the optical density of WO_3 thin film is up to 0.64, and the cycle life is up to 1500 weeks.