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一、引言近几年来,随着电子器件向高频、高集成度方向发展,要求制作最细线条为微米、亚微米级微细图形的掩膜板,普通光学老工艺碰到了难以逾越的困难。而计算机控制的电子束扫描曝光系统,因具有较高的精密度和较好的灵活性,在国内外都获得突飞猛进的发展。超大规模集成电路、磁泡存储器、高频大功率管、微波晶体管、集成光学器件、声表面波器件等,因此相继制造出来。如何改进我国目前的电子束曝光系统,使得在几项主要指标上赶上或超过目前欧美同类机的水平,进而提高生产效率,是我国电子束机的主要研究课题之一。
I. INTRODUCTION In recent years, with the development of electronic devices toward high-frequency and high-integration, it is required to make the mask with the finest lines of micron and sub-micron fine patterns. Ordinary optical aging process has encountered insurmountable difficulties. The computer-controlled electron beam scanning exposure system, due to its high precision and good flexibility, has enjoyed rapid development both at home and abroad. Large-scale integrated circuits, bubble memory, high-frequency high-power transistors, microwave transistors, integrated optics, surface acoustic wave devices, etc., have been manufactured. How to improve the current electron beam exposure system in our country makes it possible to catch up with or exceed the current level of similar machines in Europe and the United States on several key indicators and improve the production efficiency. This is one of the major research topics in China's electron beam machine.