检测硅抛光片及硅外延片中的生长管道和星形结构缺陷，常规的方法是化学腐蚀法。该方法对样片有破坏性。本文介绍一种检测硅片中生长管道和星形结构缺陷的新方法——“魔镜”检测方法［１］。该方法对检测各种镜状表面具有无损、直观、快速有效等优点。用魔镜检测法与常规的化学腐蚀方法进行了比较，其结果吻合相当好 Detection of silicon polishing films and silicon epitaxial wafers in the growth of pipe and star structure defects, the conventional method is the chemical etching method. This method is destructive to the swatch. This article presents a new method for detecting defects in growth ducts and star structures in silicon wafers - the “magic mirror” detection method [1]. The method has the advantages of non-destructive, visual, quick and effective detection of various mirror-like surfaces. With the mirror detection method and the conventional chemical etching method were compared, the results are in good agreement