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通过对扁芝〔Ｅｌｆｖｉｎｇｉａ，ａｐｐｌａｎａｔａ（Ｐｅｒｓ．ｅｘＧｒａｙ）Ｋａｒｓｔ＝Ｇａｎｏｄｅｒｍａａｐｐｌａｎａｔｕｍ（Ｐｅｒｓ．）Ｐａｔ〕生物学特性的研究，结果表明该菌在烨树汁培养基上生长最好，其次为ＰＤＡ；最适生长温度为３０℃：在ｐＨ＝３～８范围内均可生长、以ｐＨ＝４～５时生长最好；果糖和蔗糖是菌丝生长的最佳碳源；最佳氮源为脲素和天灭门冬素，无光照时菌丝生长最好。
The biological characteristics of Elfvingia, applanata (Pers.exGray) Karst = Ganoderma applanatum (Pers.) Pat were studied. The results showed that the strain grew best on Ye sap, followed by PDA. The optimal growth The temperature was 30 ℃: growth in the range of pH = 3 ~ 8, the best growth at pH = 4 ~ 5; fructose and sucrose were the best carbon sources for mycelium growth; Asparagine, no light best mycelium growth.