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针对40Cr需要提高表面性能的需求,采用磁控溅射对40Cr表面涂覆Cr层,利用电子束对涂层表面进行照射重熔。通过扫描电镜、XRD衍射仪、硬度测量仪等观察分析不同电子束工艺参数处理后的表面形貌、界面组织、元素扩散情况,并检测表面硬度。结果表明:40Cr表面涂覆Cr层后经电子束工艺处理,表面形成大量的熔坑并伴有较清晰的“褶皱”形貌,适当的照射电压、次数能使涂层与基体发生重熔并伴有明显的元素扩散,重熔工艺会使材料表层晶粒细化,在较小脉冲次数的工艺参数下,涂层表层会有新物相产生,随照射次数增加,材料表面硬度提高。
For 40Cr need to improve the performance of the surface needs, the use of magnetron sputtering coating 40Cr Cr layer, the surface of the coating by electron beam remelting. The surface morphology, interfacial microstructure and elemental diffusion after different electron beam processing parameters were observed and analyzed by means of scanning electron microscope, XRD and hardness measuring instrument, and the surface hardness was measured. The results show that the 40Cr surface is coated with Cr layer and then treated by electron beam. The surface of the 40Cr is formed with a large number of craters with clearer “wrinkle ” morphology. Appropriate irradiation voltage and the number of times can make the coating and the substrate heavier Melting and accompanied by obvious element diffusion, remelting process will make the material surface grain refinement, in the smaller pulse number of process parameters, the coating surface layer will have a new phase, with the increase in the number of shots, the surface hardness of the material increased .