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利用原子光刻的方法制备纳米结构的光栅已经成为了一种较为成熟的工艺。通过原子与激光驻波场的相互作用,利用原子自生在势能场中的偶极力对原子的密度进行调制,从而得到所需要的光栅结构。利用此种工艺所制备的光栅相对于传统工艺来说具有精度高,光栅常数直接溯源于原子能级。希望能够通过对激光的改良来提升原子沉积结果。通过双层驻波场来提高原子沉积质量已经被多次提到。实验中利用几何光学的方法实现了所需要的新型激光驻波场。并对其汇聚,相干等特性进行了研究,取得了较为满意的结果。为利用双层驻波场来沉积原子打下了基础。
The use of atomic lithography method to prepare nanostructured grating has become a more mature technology. Through the interaction between the atom and the standing wave field of the laser, the density of the atoms is modulated by the dipole force of the atom self-generated in the potential field to obtain the desired grating structure. The grating prepared by this kind of method has the advantages of high precision compared with the traditional process, and the grating constant directly traced to the atomic level. Hope that through the improvement of the laser to enhance atomic deposition results. The quality of atomic deposition has been repeatedly mentioned by double standing wave fields. In the experiment, a new type of laser standing wave field is realized by using the method of geometrical optics. And its convergence, coherence and other characteristics were studied and achieved more satisfactory results. Laying the foundation for the use of double standing wave fields to deposit atoms.