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研究了抛光液中H2O2和水杨酸浓度对钌的抛光速率的影响。采用电化学方法和X射线光电子能谱分析了H2O2和水杨酸对金属钌腐蚀效果的影响;采用原子力显微镜观察钌表面的微观形貌。结果表明:水杨酸浓度的增加有利于金属钌表面钝化膜的形成,抛光速率值随之增加;随着H2O2浓度的不断增加,抛光速率不断增加,当H2O2质量分数大于3%时,抛光速率值随浓度的增加而降低。抛光后的金属钌表面平均粗糙度Ra为7.2 nm。
The effects of H2O2 and salicylic acid concentration on polishing rate of ruthenium were investigated. The effects of H2O2 and salicylic acid on ruthenium metal corrosion were analyzed by electrochemical method and X-ray photoelectron spectroscopy. The morphology of ruthenium surface was observed by atomic force microscopy. The results show that the increase of salicylic acid concentration is beneficial to the formation of passivation film on the surface of ruthenium metal, and the polishing rate increases with the increase of H2O2 concentration. The polishing rate increases with the increase of H2O2 concentration. When H2O2 mass fraction is more than 3% The rate decreases with increasing concentration. The surface roughness Ra of polished metal ruthenium is 7.2 nm.