结合实际工作,分析、探讨了影响电子束曝光机加工微细化的因素。这些因素主要有:抗蚀剂材料、电子束本身、电子束曝光机控制线路、器件结构和电子束工艺等。在诸影响因素中,工艺的影响是目前一个较大且较主要的影响因素,其次是背散射电子束的影响,对后者,我们采用辅助曝光方法加以改善,效果良好。但对工艺等的影响因素的改善尚待继续研究、摸索。 Combined with the actual work, analysis and discussion of the factors that affect the electron beam lithography machining miniaturization. These factors are mainly: resist material, electron beam itself, electron beam exposure machine control circuit, device structure and electron beam technology. Among the influencing factors, the impact of the process is a larger and more important factor at present, followed by the influence of backscattered electron beam. For the latter, we use the auxiliary exposure method to improve and work well. However, the improvement of factors such as technology remains to be studied and explored.