论文部分内容阅读
分析了磁光记录技术的发展趋势，研究了磁光盘的结构及溅射工艺，研究成功了宽温（使用温度范围-20～＋60℃、高湿60％～95％RH）抗恶劣环境的磁光盘。
The development trend of magneto-optical recording technology is analyzed. The structure of magneto-optical disk and the sputtering process are studied. The successful application of a wide range of temperature (-20 ~ +60 ℃, 60% ~ 95% RH) CD.