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噪声机构主要有三种:热噪声、低频噪声(也叫1/f噪声)、和散弹噪声。另外,对超低频信号:外界的干扰,放大器的O漂也和噪声混杂在一起,形成总的“噪声”。我们要讨论的低噪工艺就是和这种总噪声作斗争的手段和办法。本文主要探讨实现低噪声的工艺。一、低噪声的屏蔽工艺: 由于干扰会和系统本身的噪声混杂在一起形成总的噪声,所以首先就要研究把干扰降低到最低水平的办法,这就是屏蔽的办法。几乎所有的低噪声部件都毫无例外地加以严格的屏蔽。由于干扰源的性质、频率不同,屏蔽又分静电屏蔽,电磁屏蔽和磁屏蔽三种。我们在制作一个示波器的前置放大器时,(该前置器的输入阻抗为10M,增益为
There are three main noise mechanisms: thermal noise, low frequency noise (also known as 1 / f noise), and shot noise. In addition, the ultra-low frequency signal: the external interference, amplifier O blends and noise are mixed together to form the total “noise.” The low-noise process that we are discussing is the means and method of combating this total noise. This article focuses on the realization of low noise technology. First, the low-noise shielding process: Since the interference and the system itself will be mixed together to form the total noise noise, we must first study to minimize the interference interference approach, which is the shielding method. Almost all low-noise components are strictly without exception. Due to the nature of the interference source, the frequency is different, the shield is sub-static shielding, electromagnetic shielding and magnetic shielding three. When we make an oscilloscope preamplifier, (the front of the input impedance of 10M, the gain is