表面缺陷和表面扩散在真空镀膜、薄膜半导体器件工艺、粉末冶金、多孔载体上催化剂颗粒的稳定性等实际问题中有重要的作用,得到了广泛的重视.本讲主要介绍晶体表面的原子结构、表面缺陷、表面扩散和有关的一些实验研究方法. 一、晶体表面的原子结构 理想的具有平移对称性的晶体 Surface defects and surface diffusion in the vacuum coating, thin film semiconductor device technology, powder metallurgy, the stability of the catalyst particles on the porous carrier and other practical problems have an important role, has received widespread attention.This talk mainly introduces the atomic structure of the crystal surface, Surface defects, surface diffusion and some related experimental research methods. First, the atomic structure of the crystal surface The ideal crystal with translational symmetry