New Method of Total Ionizing Dose Compact Modeling in Partially Depleted Silicon-on-Insulator MOSFET

来源 :Chinese Physics Letters | 被引量 : 0次 | 上传用户:wpf82011
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On the basis of a detailed discussion of the development of total ionizing dose(TID) effect model,a new commercial-model-independent TID modeling approach for partially depleted silicon-on-insulator metal-oxidesemiconductor field effect transistors is developed.An exponential approximation is proposed to simplify the trap charge calculation.Irradiation experiments with ~(60)Co gamma rays for IO and core devices are performed to validate the simulation results.An excellent agreement of measurement with the simulation results is observed. On the basis of a detailed discussion of the development of total ionizing dose (TID) effect model, a new commercial-model-independent TID modeling approach for partially depleted silicon-on-insulator metal-oxide semiconductor field effect transistors is developed. An exponential approximation is proposed to simplify the trap charge calculation. Irradiation experiments with ~ (60) Co gamma rays for IO and core devices are validated the simulation results. An excellent agreement of measurement with the simulation results is observed.
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